thin films. ITO is the most common and widely used TCO which has good properties in terms of
high transparency and conductivity[8-13]. The advantage of ITO is that it can be easily
fabricated at room temperature by magnetron sputtering [5] on both glass and plastic substrates.
However, it looses its good electrical conductivity on thermal annealing at 350 °C in air
atmosphere [6]. On the other hand amorphous Indium gallium zinc oxide (a-IGZO) is another
potential TCO material which can also be easily deposited at ambient temperature by RF
magnetron sputtering. However the as-deposited IGZO samples have poorer electrical
conductivity, but show a high improvement in conductivity when annealed at high (over 300 °C)
temperatures. On the basis of these rationalities, the main objective of the present research work
is focused on the development of a double-layered transparent composite IGZO/ITO electrode.
The bilayer thin films are deposited without direct substrate heating, and expected to exhibit
good electrical properties even when annealed at higher temperature. The thermal stability of the
thin film had been studied and the effect of annealing in various environments had been
discussed in details.
EXPERIMENTAL DETAILS
IGZO/ITO double-layered transparent composite electrodes were deposited on 2 mm thick
soda-lime glass substrates at room temperature by two sequential RF magnetron sputtering
processes of ITO and InGaZnO
4
targets. The In and Ga content is about 25 at. % and 35 at. %
respectively, in the mixed oxide. The base pressure of the sputter system prior to each deposition
was approximately 1x10
−7
Torr. The deposition was performed at a pressure of 10 mTorr for ITO
and 20 mTorr for IGZO in pure Ar gas (99.999%). The depositional parameters for sputtering of
both the individual metal oxides had been optimized prior to the bilayer deposition. The ITO and
IGZO layers were deposited using an rf power of 100 W and 150 W, respectively. The target-to-
substrate distance was maintained at 6 cm for all the depositions. The thickness of the ITO and
IGZO layers were measured using optical ellipsometry. The bottom ITO layer was kept constant
at 50 nm while the top IGZO layer was varied between 10 nm to 100 nm. Post deposition, the
IGZO/ITO bilayers were annealed at 100 °C, 200 °C, 300 °C and 400 °C in a quartz tube furnace
in air atmosphere for 3 hours in order to study their thermal stability. Optical transmittance of the
multilayers were measured using an Ocean Optics double channel spectrometer (model DS200)
in the wavelength range of 300–800 nm with an air reference for transmittance. Tungsten
halogen and deuterium lamps were used as sources for visible and UV light, respectively. Hall
measurements were done using a HMS3000 instrument. Electrical resistivity, Hall mobility, and
carrier concentration of the films were measured by means of the Van der Pauw method. A
magnetic field of 0.98 T was applied perpendicular to the sample surface.
RESULTS
IGZO and ITO thin films exhibit a considerably different behavior in their electrical
properties when they are exposed at high temperatures (Fig. 1). The as-deposited has lower
electrical resistivity at room temperature than ITO and it became better on thermal annealing at
above 300
o
C. However the electrical resistivity in IGZO is seen to increase with annealing
temperature and showed significant rise after 300
o
C. However, in both the materials shallow
donor levels present near the conduction band results in forming Drude-like absorption in far
infrared wavelengths [7] leaving the material transparent in the visible region (400–800 nm). For
IGZO films, this donor levels come from oxygen intrinsic defects and impurity doping.